1. General Information

• Model: ZMI‑4104（also ZMI‑4104C）

• Manufacturer: ZYGO（AMETEK brand）

• Product Type: 4‑channel laser interferometer receiver / displacement measurement board

• Application: Semiconductor lithography, nano‑positioning, precision machining, optical metrology, aerospace alignment

• Form Factor: 6U VME64x boardZYGO

• Compatibility: ZYGO ZMI‑series lasers（7705, 7702, 7714, 7724）

• Calibration: NIST‑traceable

2. Optical & Measurement Specifications

• Measurement Principle: Heterodyne laser interferometry（632.8 nm HeNe / fiber laser）

• Channels per Board: 4 differential interferometer inputs

• Resolution: 0.154 nm（sub‑nanometer）

• Linearity Error: ±0.5 ppm

• Max Measurement Speed: ±2.55 m/s

• Accuracy at Max Speed: 0.2 nm（σ）

• Minimum Optical Power: 0.07 µWZYGO

• Wavelength Stability: <0.0001 nm

• Coherence Length: >100 m

• Sampling Rate: 5 MHz

• Channel Synchronization Jitter: <2 ns

3. Environmental Compensation

• Onboard Sensors: Temperature, humidity, pressure

• Algorithm: Dynamic Signal Correction（DSC）；refractive index compensation

• Accuracy Stability: ±0.1 ppm under factory conditions

4. Communication & Interfaces

• Bus: VME64x（backplane）ZYGO

• Real‑Time I/F: EtherCAT（cycle time ≤100 µs）

• Data Output: Position, velocity, status, diagnostics

• Expansion: Up to 64 axes via modular stacking

5. Electrical

• Supply: +5 VDC（VME backplane）

• Power Consumption: ~15 W（typical）

• FPGA: Dual‑redundant for reliability

6. Environmental Ratings

• Operating Temp: 0 °C to +50 °C

• Storage Temp: −40 °C to +85 °C

• Humidity: 5%–95% RH, non‑condensing

• Vibration: IEC 60068‑2‑6 compliant

• Protection: Conformal coated; ESD hardened

7. Mechanical

• Dimensions: 6U VME（approx. 233 × 160 mm）

• Mounting: Standard VME slot, hot‑swap capable

• Weight: ~0.4 kg

8. Key Features

• Sub‑nanometer resolution（0.154 nm）

• 4‑channel synchronous measurement

• High speed up to ±2.55 m/s

• Environmental drift compensation

• EtherCAT real‑time interface

• Modular scalability to 64 axes

9. Applications

• Semiconductor wafer stage & lithography positioning

• Precision machine tool feedback

• Optical component manufacturing

• Aerospace & vacuum‑system metrology

• Nano‑positioning & research