AERA FC-7700-RP

Product Details AERA FC-7700-RP is a high-precision mass flow controller built for accurate gas flow regulation in semiconductor and vacuum process systems. This mass flow controller adopts elastomer sealing design and analog control mode to deliver stable gas flow measurement and adjustment. The mass flow controller features fast response speed, which can reach stable flow within 2 seconds after receiving setpoint signals. This mass flow controller supports multiple standard gas types and wide flow range options to match different process requirements.

The semiconductor gas control unit is designed for non-corrosive gas applications in CVD, PVD, etching and sputtering processes. The semiconductor gas control unit has excellent repeatability and linearity to guarantee consistent product quality during continuous production. The semiconductor gas control unit supports normally closed solenoid valve structure for safe gas cut-off when power failure occurs. The semiconductor gas control unit is equipped with standard gas port and electrical connector for convenient installation and system integration.

This unit maintains low leak rate and stable performance under proper working pressure range. The vacuum process flow regulator is widely used in flat panel display, optical coating and fiber manufacturing equipment. The vacuum process flow regulator provides real-time flow feedback signal for closed-loop process control. The vacuum process flow regulator can effectively resist slight pressure fluctuation to avoid flow deviation. The vacuum process flow regulator serves as reliable replacement spare part for maintenance of old semiconductor process equipment.